Published in
American Institute of Physics, Journal of Applied Physics, 19(129), p. 195302, 2021
DOI: 10.1063/5.0048304
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Thermal and oxidation stability of Ti<sub>x</sub>W<sub>1−x</sub> diffusion barriers investigated by soft and hard x-ray photoelectron spectroscopy
Journal article published in 2021 by
C. Kalha 
,
S. Bichelmaier,
N. K. Fernando ,
J. V. Berens ,
P. K. Thakur ,
T.-L. Lee,
J. J. Gutiérrez Moreno ,
S. Mohr ,
L. E. Ratcliff ,
M. Reisinger,
J. Zechner,
M. Nelhiebel,
A. Regoutz
,
S. Bichelmaier,
N. K. Fernando ,
J. V. Berens ,
P. K. Thakur ,
T.-L. Lee,
J. J. Gutiérrez Moreno ,
S. Mohr ,
L. E. Ratcliff ,
M. Reisinger,
J. Zechner,
M. Nelhiebel,
A. Regoutz
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