Published in
American Institute of Physics, Journal of Vacuum Science and Technology A, 4(39), p. 042602, 2021
DOI: 10.1116/6.0000995
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Thermal atomic layer etching of amorphous and crystalline Al<sub>2</sub>O<sub>3</sub> films
Journal article published in 2021 by
Jessica A. Murdzek 
,
Adarsh Rajashekhar,
Raghuveer S. Makala,
Steven M. George
,
Adarsh Rajashekhar,
Raghuveer S. Makala,
Steven M. George
This paper is made freely available by the publisher.
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