Published in
Journal of Micro/Nanopatterning, Materials, and Metrology, 03(20), 2021
DOI: 10.1117/1.jmm.20.3.034603
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Chemical and structural characterization of EUV photoresists as a function of depth by standing-wave x-ray photoelectron spectroscopy
Journal article published in 2021 by
Giuseppina Conti,
Henrique P. Martins 
,
Isvar A. Cordova,
Jonathan Ma,
Rudy J. Wojtecki,
Patrick Naulleau,
Slavomír Nemšák
,
Isvar A. Cordova,
Jonathan Ma,
Rudy J. Wojtecki,
Patrick Naulleau,
Slavomír Nemšák
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