Dissemin is shutting down on January 1st, 2025

Published in

AAPPS Bulletin, 1(32), 2022

DOI: 10.1007/s43673-021-00033-0

Links

Tools

Export citation

Search in Google Scholar

β-Ga2O3 material properties, growth technologies, and devices: a review

Journal article published in 2022 by Masataka Higashiwaki ORCID
This paper is made freely available by the publisher.
This paper is made freely available by the publisher.

Full text: Download

Question mark in circle
Preprint: policy unknown
Question mark in circle
Postprint: policy unknown
Question mark in circle
Published version: policy unknown

Abstract

AbstractRapid progress in β-gallium oxide (β-Ga2O3) material and device technologies has been made in this decade, and its superior material properties based on the very large bandgap of over 4.5 eV have been attracting much attention. β-Ga2O3 appears particularly promising for power switching device applications because of its extremely large breakdown electric field and availability of large-diameter, high-quality wafers manufactured from melt-grown bulk single crystals. In this review, after introducing material properties of β-Ga2O3 that are important for electronic devices, current status of bulk melt growth, epitaxial thin-film growth, and device processing technologies are introduced. Then, state-of-the-art β-Ga2O3 Schottky barrier diodes and field-effect transistors are discussed, mainly focusing on development results of the author’s group.