Published in
Institute of Electrical and Electronics Engineers, IEEE Access, (10), p. 68724-68730, 2022
DOI: 10.1109/access.2022.3183593
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Effect of ALD Processes on Physical and Electrical Properties of HfO<sub>2</sub> Dielectrics for the Surface Passivation of a CMOS Image Sensor Application
Journal article published in 2022 by
Honggyun Kim,
Vijay D. Chavan 
,
Jamal Aziz ,
Byoungsu Ko,
Jae-Sung Lee ,
Junsuk Rho ,
Tukaram D. Dongale,
Kyeong-Keun Choi ,
Deok-Kee Kim
,
Jamal Aziz ,
Byoungsu Ko,
Jae-Sung Lee ,
Junsuk Rho ,
Tukaram D. Dongale,
Kyeong-Keun Choi ,
Deok-Kee Kim
This paper is made freely available by the publisher.
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