Abstract Standalone structures with periodic surface undulations or ripples can be spontaneously created upon flowing a liquid metal, e.g. Ga, over a metallic film, e.g. Pt, Au, etc, through a complex ‘wetting-reaction’-driven process. Due to the ability of 3-dimensional patterning at the small length scale in a single step, the liquid metal ‘ripple’ flow is a promising non-conventional patterning technique. Herein, we examine the effect of a few process parameters, such as distance away from the liquid reservoir, size of the liquid reservoir, and the geometry, thickness, and width of substrate metal film, on the nature of the ripple flow to produce finer patterns with feature sizes of ≤ 2 μm. The height and the pitch of the pattern decrease with distance from the liquid reservoir and decrease in the reservoir volume. Furthermore, a decrease in the thickness and width of the substrate film also leads to a decrease in the height and pitch of the ripples. Finally, the application of an external electric field also controls the ripple patterns. By optimizing various parameters, standalone ripple structures of Ga with the height and pitch of ≤ 500 nm are created. As potential applications, the ripple patterns with micro-and nano-scopic features are demonstrated to produce a diffraction grating and a die for micro-stamping.