Published in
American Chemical Society, Nano Letters, 18(22), p. 7432-7440, 2022
DOI: 10.1021/acs.nanolett.2c02339
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Patterning at the Resolution Limit of Commercial Electron Beam Lithography
Journal article published in 2022 by
Mohammad S. M. Saifullah 
,
Mohamed Asbahi,
Darren C. J. Neo ,
Zackaria Mahfoud,
Hui Ru Tan,
Son Tung Ha ,
Neeraj Dwivedi ,
Tanmay Dutta,
Surani bin Dolmanan,
Zainul Aabdin ,
Michel Bosman ,
Ramakrishnan Ganesan ,
Sudhiranjan Tripathy ,
David G. Hasko,
Suresh Valiyaveettil
,
Mohamed Asbahi,
Darren C. J. Neo ,
Zackaria Mahfoud,
Hui Ru Tan,
Son Tung Ha ,
Neeraj Dwivedi ,
Tanmay Dutta,
Surani bin Dolmanan,
Zainul Aabdin ,
Michel Bosman ,
Ramakrishnan Ganesan ,
Sudhiranjan Tripathy ,
David G. Hasko,
Suresh Valiyaveettil
This paper is made freely available by the publisher.
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