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IOP Publishing, Semiconductor Science and Technology, 6(36), p. 065003, 2021

DOI: 10.1088/1361-6641/abf29d

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Empirical metal-oxide RRAM device endurance and retention model for deep learning simulations

Journal article published in 2021 by Corey Lammie ORCID, Mostafa Rahimi Azghadi ORCID, Daniele Ielmini ORCID
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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Abstract

Abstract Memristive devices including resistive random access memory (RRAM) cells are promising nanoscale low-power components projected to facilitate significant improvement in power and speed of Deep Learning (DL) accelerators, if structured in crossbar architectures. However, these devices possess non-ideal endurance and retention properties, which should be modeled efficiently. In this paper, we propose a novel generalized empirical metal-oxide RRAM endurance and retention model for use in large-scale DL simulations. To the best of our knowledge, the proposed model is the first to unify retention-endurance modeling while taking into account time, energy, SET-RESET cycles, device size, and temperature. We compare the model to state-of-the-art and demonstrate its versatility by applying it to experimental data from fabricated devices. Furthermore, we use the model for CIFAR-10 dataset classification using a large-scale deep memristive neural network (DMNN) implementing the MobileNetV2 architecture. Our results show that, even when ignoring other device non-idealities, retention and endurance losses significantly affect the performance of DL networks. Our proposed model and its DL simulations are made publicly available.