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Published in

Institute of Electrical and Electronics Engineers, IEEE Electron Device Letters, 1(6), p. 11-13, 1985

DOI: 10.1109/edl.1985.26025

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A four-vacuum-cycle lift-off process for the polycrystalline CdSe thin-film transistor

Journal article published in 1985 by J. Vanfleteren ORCID, A. Van Calster
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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Abstract

A photolithographic process is described for the fabrication of the polycrystalline CdSe thin-film transistor (TFT). This process only uses four vacuum cycles and four lift-off masks, without the need of sputter cleaning to prevent contamination. The devices made have a stability similar to the ones made by the single-vacuum process.