Published in
American Chemical Society, Nano Letters, 9(21), p. 3827-3834, 2021
DOI: 10.1021/acs.nanolett.1c00251
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Nanoscale Bilayer Mechanical Lithography Using Water as Developer
Journal article published in 2021 by
Yu Shu,
Benjamin F. Porter,
Eugene J. H. Soh 
,
Nikolaos Farmakidis,
Seongdong Lim,
Yang Lu,
Jamie H. Warner ,
Harish Bhaskaran
,
Nikolaos Farmakidis,
Seongdong Lim,
Yang Lu,
Jamie H. Warner ,
Harish Bhaskaran
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
Preprint: archiving allowed
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- Must not violate ACS ethical Guidelines
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- Must obtain written permission from Editor
- Must not violate ACS ethical Guidelines
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