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Elsevier, Surfaces and Interfaces, (46), p. 104014, 2024

DOI: 10.1016/j.surfin.2024.104014

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New class of Zr precursor containing boratabenzene ligand enabling highly conformal wafer-scale zirconium dioxide thin films through atomic layer deposition

Distributing this paper is prohibited by the publisher
Distributing this paper is prohibited by the publisher

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