Published in
Elsevier, Surfaces and Interfaces, (44), p. 103766, 2024
DOI: 10.1016/j.surfin.2023.103766
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Atomic layer deposition mechanism of hafnium dioxide using hafnium precursor with amino ligands and water
Journal article published in 2024 by
Jing Li,
Jiayi Guo,
Zhongchao Zhou,
Rui Xu,
Lina Xu,
Yihong Ding,
Hongping Xiao,
Xinhua Li,
Aidong Li,
Guoyong Fang 
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