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Elsevier, Acta Materialia, (239), p. 118220, 2022

DOI: 10.1016/j.actamat.2022.118220

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Impact of oxygen content on phase constitution and ferroelectric behavior of hafnium oxide thin films deposited by reactive high-power impulse magnetron sputtering

This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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