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In situ study on the thermal stability and interfaces properties of Er2O3/Al2O3/Si multi stacked films by X-ray photoelectron spectroscopy

Journal article published in 2017 by B. Gao, M. Mamat, Y. Ghupur, A. Ablat, K. Ibrahim, J. Wang, C. Liu, J. Zhao ORCID
This paper was not found in any repository; the policy of its publisher is unknown or unclear.
This paper was not found in any repository; the policy of its publisher is unknown or unclear.

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