Abstract TiO₂-SiO₂ is a kind of binary component glass material with excellent properties such as high heat impact resistance, welding ability, and the size of the material is insensitive to temperature change. Based on the principle of Chemical Vapor Deposition (CVD), we used silicon tetrachloride and titanium tetrachloride as the raw materials for the preparation of this glass. In this research, we studied the morphology, structure, and particle size distribution of TiO₂-SiO₂ binary glass particles. The experimental results show that the deposition particles are spherical amorphous nanoparticles with a size of about 100nm, and there is no SiO₂ or TiO₂ crystalline phase in the particles. This particle structure overcomes the characteristic that TiO₂ is easily crystallized in other preparation methods, making preparation for TiO₂-SiO₂ binary glass possible.