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American Chemical Society, ACS Applied Materials and Interfaces, 15(6), p. 11834-11838, 2014

DOI: 10.1021/am5032105

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Atomic Layer Deposition of a High-k Dielectric on MoS2 Using Trimethylaluminum and Ozone

Journal article published in 2014 by Lanxia Cheng, Xiaoye Qin, Antonio T. Lucero, Angelica Azcatl, Jie Huang, Robert M. Wallace ORCID, Kyeongjae Cho, Jiyoung Kim
This paper is made freely available by the publisher.
This paper is made freely available by the publisher.

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