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Wiley-VCH Verlag, Plasma Processes and Polymers, 12(17), p. 2000126, 2020

DOI: 10.1002/ppap.202000126

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Effect of temperature and incident ion energy on nanostructure formation on silicon exposed to helium plasma

Journal article published in 2020 by Matt Thompson ORCID, Quan Shi ORCID, Shin Kajita ORCID, Noriyasu Ohno ORCID, Cormac Corr
This paper was not found in any repository; the policy of its publisher is unknown or unclear.
This paper was not found in any repository; the policy of its publisher is unknown or unclear.

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