Published in
American Institute of Physics, Journal of Vacuum Science and Technology A, 6(38), p. 062601, 2020
DOI: 10.1116/6.0000257
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Mechanism of SiN etching rate fluctuation in atomic layer etching
Journal article published in 2020 by
Akiko Hirata 
,
Masanaga Fukasawa ,
Katsuhisa Kugimiya,
Kojiro Nagaoka,
Kazuhiro Karahashi,
Satoshi Hamaguchi ,
Hayato Iwamoto
,
Masanaga Fukasawa ,
Katsuhisa Kugimiya,
Kojiro Nagaoka,
Kazuhiro Karahashi,
Satoshi Hamaguchi ,
Hayato Iwamoto
This paper was not found in any repository, but could be made available legally by the author.
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