Area‐Selective Growth of HfS<sub>2</sub> Thin Films via Atomic Layer Deposition at Low Temperature
Journal article published in 2020 by
Yuanyuan Cao,
Tobias Wähler,
Tadahiro Yokosawa,
Hyoungwon Park,
Annemarie Prihoda,
Narine Moses Badlyan,
Lukas Fromm,
Bingzhe Wang,
Dirk M. Guldi 
,
Johannes Will ,
Andreas Görling,
Janina Maultzsch ,
Tobias Unruh ,
Erdmann Spiecker ,
Marcus Halik
and other authors.
,
Johannes Will ,
Andreas Görling,
Janina Maultzsch ,
Tobias Unruh ,
Erdmann Spiecker ,
Marcus Halik
and other authors.
This paper is made freely available by the publisher.
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