Published in
Institute of Electrical and Electronics Engineers, IEEE Electron Device Letters, 12(41), p. 1762-1765, 2020
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Integration of hafnium oxide on epitaxial SiGe for p-type ferroelectric FET application
Journal article published in 2020 by
Maximilian Lederer 
,
Franz Muller ,
Kati Kuhnel,
Ricardo Olivo,
Konstantin Mertens,
Martin Trentzsch,
Stefan Dunkel,
Johannes Muller,
Sven Beyer,
Konrad Seidel,
Thomas KCmpfe,
Thomas Kampfe ,
Lukas M. Eng
,
Franz Muller ,
Kati Kuhnel,
Ricardo Olivo,
Konstantin Mertens,
Martin Trentzsch,
Stefan Dunkel,
Johannes Muller,
Sven Beyer,
Konrad Seidel,
Thomas KCmpfe,
Thomas Kampfe ,
Lukas M. Eng
This paper was not found in any repository, but could be made available legally by the author.
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