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Wiley, Advanced Materials Interfaces, 18(7), p. 2000854, 2020

DOI: 10.1002/admi.202000854

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Heater‐Free and Substrate‐Independent Growth of Vertically Standing Graphene Using A High‐Flux Plasma‐Enhanced Chemical Vapor Deposition

Journal article published in 2020 by Zhiheng Wu, Yongshang Zhang, Yonglong Shen ORCID, Wei Zhang, Guosheng Shao ORCID
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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