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IOP Publishing, Journal of Physics D: Applied Physics, 17(44), p. 174030, 2011

DOI: 10.1088/0022-3727/44/17/174030

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Computer modelling of the plasma chemistry and plasma-based growth mechanisms for nanostructured materials

Journal article published in 2011 by Annemie Bogaerts ORCID, Maxie Eckert, Ming Mao, Erik Neyts ORCID
This paper is available in a repository.
This paper is available in a repository.

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Abstract

In this review paper, an overview is given of different modelling efforts for plasmas used for the formation and growth of nanostructured materials. This includes both the plasma chemistry, providing information on the precursors for nanostructure formation, as well as the growth processes itself. We limit ourselves to carbon (and silicon) nanostructures. Examples of the plasma modelling comprise nanoparticle formation in silane and hydrocarbon plasmas, as well as the plasma chemistry giving rise to carbon nanostructure formation, such as (ultra)nanocrystalline diamond ((U)NCD) and carbon nanotubes (CNTs). The second part of the paper deals with the simulation of the (plasma-based) growth mechanisms of the same carbon nanostructures, i.e. (U)NCD and CNTs, both by mechanistic modelling and detailed atomistic simulations.