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Published in

American Institute of Physics, Applied Physics Letters, 13(98), p. 131502

DOI: 10.1063/1.3574365

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Elucidating the asymmetric behavior of the discharge in a dual magnetron sputter deposition system

Journal article published in 2011 by Maksudbek Yusupov, Evi Bultinck, Diederik Depla, Annemie Bogaerts ORCID
This paper is available in a repository.
This paper is available in a repository.

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Data provided by SHERPA/RoMEO

Abstract

A magnetron discharge is characterized by drifts of the charged particles guiding center, caused by the magnetic field, in contrast to unmagnetized discharges. Because of these drifts, a pronounced asymmetry of the discharge can be observed in a dual magnetron setup. In this work, it is found that the shape of the discharge in a dual magnetron configuration depends on the magnetic field configuration. In a closed configuration, strong drifts were observed in one preferential direction, whereas in a mirror configuration the deflection of the discharge was not so pronounced. Our calculations confirm experimental observations.