Abstract Preparation of ordered CoPt on Si substrates is significant for expanding future applications of spintronic devices. In this study, ordered CoPt alloys including the L1₀ phase with a maximum coercivity of 2.1 kOe are formed in electron-beam-deposited 11.4 nm thick Pt/Co bilayer thin films on Si/SiO₂ substrates via interdiffusion during rapid thermal annealing (RTA). The effects of RTA temperature on the magnetic properties, crystal structures, cross-sectional elemental profiles, and surface morphologies of the films are analyzed by vibrating sample magnetometer (VSM), grazing incidence x-ray diffraction (GI-XRD), energy-dispersive x-ray spectroscopy (EDX), and scanning electron microscope (SEM), respectively. For the as-deposited film, polycrystalline Pt was confirmed by uniform Debye–Scherrer rings of Pt. At 200 °C, interdiffusion between Co and Pt atoms in the film started to be observed by EDX elemental maps, and at 300 °C, alloying of Co and Pt atoms was confirmed by diffraction peaks corresponding to A1-disordered CoPt. At 400 °C, the in-plane coercivity of the film began to increase. At 700 °C, ordered CoPt alloys were confirmed by superlattice diffraction peaks. At 800 °C, a graded film containing L1₀-ordered CoPt was found to be formed and a maximum coercivity of 2.1 kOe was observed by VSM, where the easy axis of magnetization was oriented along the in-plane direction. At 900 °C, deformation of the ordered CoPt alloys was observed by GI-XRD, and the grain size of the film reached a maximum.