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Royal Society of Chemistry, Materials Advances, 2(1), p. 167-176, 2020

DOI: 10.1039/d0ma00072h

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Role of the electronically-active amorphous state in low-temperature processed In2O3 thin-film transistors

This paper is made freely available by the publisher.
This paper is made freely available by the publisher.

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Abstract

Process-structure-transport relationships in low-temperature-processed, blade-coated In2O3 transistors using sol–gel and combustion chemistries are explored with X-ray scattering techniques. Electron mobility of ≈4.5 cm2 V−1 s−1 is achieved at ≈220 °C.