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American Chemical Society, Chemistry of Materials, 6(32), p. 2399-2407, 2020

DOI: 10.1021/acs.chemmater.9b04833

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Influence of Additives on the Interfacial Width and Line Edge Roughness in Block Copolymer Lithography

Journal article published in 2020 by Daniel F. Sunday ORCID, Xuanxuan Chen, Thomas R. Albrecht, Derek Nowak, Paulina Rincon Delgadillo, Takahiro Dazai, Ken Miyagi, Takaya Maehashi, Akiyoshi Yamazaki, Paul F. Nealey ORCID, R. Joseph Kline
This paper was not found in any repository; the policy of its publisher is unknown or unclear.
This paper was not found in any repository; the policy of its publisher is unknown or unclear.

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