Published in
Journal of Micro/Nanopatterning, Materials, and Metrology, 01(20), 2021
DOI: 10.1117/1.jmm.20.1.014901
Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020, 2020
DOI: 10.1117/12.2551455
Links
- ORCID
- Society of Photo-optical Instrumentation Engineers
- Society of Photo-optical Instrumentation Engineers
Tools
Photothermal alternative to device fabrication using atomic precision advanced manufacturing techniques
Journal article published in 2020 by
Aaron M. Katzenmeyer,
Sanja Dmitrovic 
,
Andrew D. Baczewski,
Quinn Campbell,
Ezra Bussmann,
Tzu-Ming Lu,
Evan M. Anderson,
Scott W. Schmucker,
Jeff Ivie,
DeAnna M. Campbell,
Daniel R. Ward,
David A. Scrymgeour,
George T. Wang,
Shashank Misra
,
Andrew D. Baczewski,
Quinn Campbell,
Ezra Bussmann,
Tzu-Ming Lu,
Evan M. Anderson,
Scott W. Schmucker,
Jeff Ivie,
DeAnna M. Campbell,
Daniel R. Ward,
David A. Scrymgeour,
George T. Wang,
Shashank Misra
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
Preprint: archiving forbidden
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