Published in
IOP Publishing, Japanese Journal of Applied Physics, SJ(59), p. SJJC01, 2020
DOI: 10.35848/1347-4065/ab7baa
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On-wafer monitoring and control of ion energy distribution for damage minimization in atomic layer etching processes
Journal article published in 2020 by
A. Hirata 
,
M. Fukasawa ,
K. Kugimiya,
K. Nagaoka,
K. Karahashi,
S. Hamaguchi ,
H. Iwamoto
,
M. Fukasawa ,
K. Kugimiya,
K. Nagaoka,
K. Karahashi,
S. Hamaguchi ,
H. Iwamoto
This paper is made freely available by the publisher.
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