Published in
International Journal of Extreme Manufacturing, 3(1), p. 032001, 2019
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At wavelength coherent scatterometry microscope using high-order harmonics for EUV mask inspection
Journal article published in 2019 by
Yutaka Nagata 
,
Tetsuo Harada,
Takeo Watanabe,
Hiroo Kinoshita,
Katsumi Midorikawa
,
Tetsuo Harada,
Takeo Watanabe,
Hiroo Kinoshita,
Katsumi Midorikawa
This paper was not found in any repository, but could be made available legally by the author.
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