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Wiley-VCH Verlag, Chemical Vapor Deposition, 12(12), p. 712-714, 2006

DOI: 10.1002/cvde.200604233

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CVD of CrO2: towards a lower temperature deposition process

Journal article published in 2006 by Pedro M. Sousa, Sonia A. Dias, Antonio J. Silvestre ORCID, Olinda Conde ORCID, Benjamin Morris, Karen A. Yates, William R. Branford, Lesley F. Cohen
This paper is available in a repository.
This paper is available in a repository.

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Abstract

Communication: The deposition of highly oriented a-axis CrO(2) films onto Al(2)O(3)(0001) by atmospheric pressure (AP)CVD at temperatures as low as 330 C is reported. Deposition rates strongly depend on the substrate temperature, whereas for film surface microstructures the dependence is mainly on film thickness. For the experimental conditions used in this work, CrO(2) growth kinetics are dominated by a surface reaction mechanism with an apparent activation energy of (121.0 +/- 4.3) kJ mol(-1). The magnitude and temperature dependence of the saturation magnetization, up to room temperature, is consistent with bulk measurements.