Published in
2019 International Semiconductor Conference (CAS), 2019
DOI: 10.1109/smicnd.2019.8924034
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Controlling SWIR photosensitivity limit by composition engineering: from Ge to GeSi nanocrystals embedded in TiO2
Proceedings article published in 2019 by
I. Dascalescu 
,
O. Cojocaru,
I. Lalau,
C. Palade,
A. Slav,
A. M. Lepadatu,
S. Lazanu,
T. Stoica,
M. L. Ciurea
,
O. Cojocaru,
I. Lalau,
C. Palade,
A. Slav,
A. M. Lepadatu,
S. Lazanu,
T. Stoica,
M. L. Ciurea
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