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Cormac Corr
Guilet et al., 2006
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@inproceedings{Guilet2006, author = {Guilet, S. and Bouchoule, S. and Jany, C. and Corr, C. S. and Chabert, P.}, month = {jan}, title = {ICP etching process development based on Cl2/H2 chemistry and adapted to non-thermalized InP wafers for the realisation of high aspect ratio and vertical sidfewall deep ridge waveguides and buried heterostructures}, year = {2006} }
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ICP etching process development based on Cl2/H2 chemistry and adapted to non-thermalized InP wafers for the realisation of high aspect ratio and vertical sidfewall deep ridge waveguides and buried heterostructures
Proceedings article published in 2006 by
S. Guilet
,
S. Bouchoule
,
C. Jany
,
C. S. Corr
,
P. Chabert
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