Published in
Elsevier, Applied Surface Science, (508), p. 145254, 2020
DOI: 10.1016/j.apsusc.2020.145254
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Effect of internal stress on short-circuit diffusion in thin films and nanolaminates: Application to Cu/W nano-multilayers
Journal article published in 2020 by
Aleksandr V. Druzhinin 
,
Bastian Rheingans,
Sebastian Siol ,
Boris B. Straumal,
Jolanta Janczak-Rusch,
Lars P. H. Jeurgens ,
Claudia Cancellieri
,
Bastian Rheingans,
Sebastian Siol ,
Boris B. Straumal,
Jolanta Janczak-Rusch,
Lars P. H. Jeurgens ,
Claudia Cancellieri
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