Published in
IOP Publishing, Journal of Physics D: Applied Physics, 10(53), p. 105103, 2019
Links
Tools
Performance enhancement of monolayer MoS2 transistors by atomic layer deposition of high-k dielectric assisted by Al2O3 seed layer
Journal article published in 2019 by
Guangyang Lin 
,
Meng-Qiang Zhao,
Meng Jia,
Jie Zhang ,
Peng Cui ,
Lincheng Wei ,
Haochen Zhao ,
A. T. Charlie Johnson,
Lars Gundlach,
Yuping Zeng
,
Meng-Qiang Zhao,
Meng Jia,
Jie Zhang ,
Peng Cui ,
Lincheng Wei ,
Haochen Zhao ,
A. T. Charlie Johnson,
Lars Gundlach,
Yuping Zeng
Distributing this paper is prohibited by the publisher
Full text: Unavailable
Preprint: archiving forbidden
Postprint:
archiving forbidden
Published version:
archiving forbidden
Data provided by 