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Wiley, physica status solidi (a) – applications and materials science, 17(216), p. 1900306, 2019

DOI: 10.1002/pssa.201900306

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Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon

Journal article published in 2019 by Svetlana Beljakowa ORCID, Peter Pichler, Bodo Kalkofen, René Hübner
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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