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Springer, Plasma Chemistry and Plasma Processing, 3(40), p. 643-660, 2019

DOI: 10.1007/s11090-019-10052-3

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Pattern Formation in High Power Impulse Magnetron Sputtering (HiPIMS) Plasmas

Journal article published in 2019 by Julian Held ORCID, Achim von Keudell
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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