Published in
American Institute of Physics, The Journal of Chemical Physics, 20(151), p. 204701, 2019
DOI: 10.1063/1.5107509
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Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
Journal article published in 2019 by
M. G. Kozodaev 
,
Y. Y. Lebedinskii ,
A. G. Chernikova ,
E. V. Korostylev ,
A. A. Chouprik ,
R. R. Khakimov ,
Andrey M. Markeev ,
C. S. Hwang
,
Y. Y. Lebedinskii ,
A. G. Chernikova ,
E. V. Korostylev ,
A. A. Chouprik ,
R. R. Khakimov ,
Andrey M. Markeev ,
C. S. Hwang
This paper was not found in any repository, but could be made available legally by the author.
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