Published in
IOP Publishing, Semiconductor Science and Technology, 12(34), p. 125008, 2019
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Process optimization of the Si0.7Ge0.3 Fin Formation for the STI first scheme
Journal article published in 2019 by
Zhiqian Zhao 
,
Yongliang Li ,
Guilei Wang,
Anyan Du,
Yan Li,
Qingzhu Zhang,
Gaobo Xu,
Yongkui Zhang,
Jun Luo ,
JunFeng Li,
Wenwu Wang
,
Yongliang Li ,
Guilei Wang,
Anyan Du,
Yan Li,
Qingzhu Zhang,
Gaobo Xu,
Yongkui Zhang,
Jun Luo ,
JunFeng Li,
Wenwu Wang
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