Published in
American Institute of Physics, Journal of Applied Physics, 16(126), p. 164301, 2019
DOI: 10.1063/1.5115036
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Defect-moderated oxidative etching of MoS2
Journal article published in 2019 by
Pierce Maguire 
,
Jakub Jadwiszczak ,
Maria O’Brien,
Darragh Keane ,
Georg S. Duesberg ,
Niall McEvoy ,
Hongzhou Zhang
,
Jakub Jadwiszczak ,
Maria O’Brien,
Darragh Keane ,
Georg S. Duesberg ,
Niall McEvoy ,
Hongzhou Zhang
This paper was not found in any repository, but could be made available legally by the author.
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