Published in
American Institute of Physics, Journal of Applied Physics, 9(126), p. 095707, 2019
DOI: 10.1063/1.5107494
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Fluctuation electron microscopy on silicon amorphized at varying self ion-implantation conditions
Journal article published in 2019 by
Dražen Radić 
,
Sven Hilke,
Martin Peterlechner ,
Matthias Posselt ,
Hartmut Bracht
,
Sven Hilke,
Martin Peterlechner ,
Matthias Posselt ,
Hartmut Bracht
This paper was not found in any repository, but could be made available legally by the author.
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