Published in
American Institute of Physics, Journal of Vacuum Science and Technology A, 5(37), p. 051001, 2019
DOI: 10.1116/1.5100547
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Atomic layer defect-free etching for germanium using HBr neutral beam
Journal article published in 2019 by
Takuya Fujii,
Daisuke Ohori 
,
Shuichi Noda,
Yosuke Tanimoto,
Daisuke Sato,
Hideyuki Kurihara,
Wataru Mizubayashi,
Kazuhiko Endo,
Yiming Li,
Yao-Jen Lee,
Takuya Ozaki,
Seiji Samukawa
,
Shuichi Noda,
Yosuke Tanimoto,
Daisuke Sato,
Hideyuki Kurihara,
Wataru Mizubayashi,
Kazuhiko Endo,
Yiming Li,
Yao-Jen Lee,
Takuya Ozaki,
Seiji Samukawa
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
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