Published in

American Chemical Society, Chemistry of Materials, 6(31), p. 1881-1890, 2019

DOI: 10.1021/acs.chemmater.8b03921

Links

Tools

Export citation

Search in Google Scholar

A Self-Limited Atomic Layer Deposition of WS2 Based on the Chemisorption and Reduction of Bis(t-butylimino)bis(dimethylamino) Complexes

Journal article published in 2019 by Yanlin Wu, Muhammad Hamid Raza ORCID, Yen-Chun Chen, Patrick Amsalem ORCID, Sebastian Wahl, Kai Skrodczky, Xiaomin Xu, Kapil Shyam Lokare, Medet Zhukush, Pooja Gaval, Norbert Koch ORCID, Elsje Alessandra Quadrelli, Nicola Pinna ORCID
This paper was not found in any repository; the policy of its publisher is unknown or unclear.
This paper was not found in any repository; the policy of its publisher is unknown or unclear.

Full text: Unavailable

Green circle
Preprint: archiving allowed
  • Must obtain written permission from Editor
  • Must not violate ACS ethical Guidelines
Upload
Orange circle
Postprint: archiving restricted
  • Must obtain written permission from Editor
  • Must not violate ACS ethical Guidelines
Upload
Red circle
Published version: archiving forbidden
Policy details
Data provided by SHERPA/RoMEO