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American Chemical Society, Chemistry of Materials, 4(31), p. 1304-1317, 2019

DOI: 10.1021/acs.chemmater.8b04456

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Self-Catalyzed, Low-Temperature Atomic Layer Deposition of Ruthenium Metal Using Zero-Valent Ru(DMBD)(CO)3 and Water

Journal article published in 2019 by Zhengning Gao ORCID, Duy Le ORCID, Asim Khaniya, Charles L. Dezelah, Jacob Woodruff, Ravindra K. Kanjolia, William E. Kaden, Talat S. Rahman, Parag Banerjee ORCID
This paper was not found in any repository; the policy of its publisher is unknown or unclear.
This paper was not found in any repository; the policy of its publisher is unknown or unclear.

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