Published in
American Chemical Society, Nano Letters, 9(19), p. 6043-6048, 2019
DOI: 10.1021/acs.nanolett.9b01911
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Plasma-Etched Pattern Transfer of Sub-10 nm Structures Using a Metal–Organic Resist and Helium Ion Beam Lithography
Journal article published in 2019 by
Scott M. Lewis 
,
Matthew S. Hunt,
Guy A. DeRose,
Hayden R. Alty,
Jarvis Li,
Alex Wertheim,
Lucia De Rose,
Grigore A. Timco ,
Axel Scherer,
Stephen G. Yeates,
Richard E. P. Winpenny
,
Matthew S. Hunt,
Guy A. DeRose,
Hayden R. Alty,
Jarvis Li,
Alex Wertheim,
Lucia De Rose,
Grigore A. Timco ,
Axel Scherer,
Stephen G. Yeates,
Richard E. P. Winpenny
This paper was not found in any repository; the policy of its publisher is unknown or unclear.
Full text: Unavailable
Preprint: archiving allowed
- Must obtain written permission from Editor
- Must not violate ACS ethical Guidelines
Postprint:
archiving restricted
- Must obtain written permission from Editor
- Must not violate ACS ethical Guidelines
Published version:
archiving forbidden
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