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American Chemical Society, Nano Letters, 9(19), p. 6043-6048, 2019

DOI: 10.1021/acs.nanolett.9b01911

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Plasma-Etched Pattern Transfer of Sub-10 nm Structures Using a Metal–Organic Resist and Helium Ion Beam Lithography

Journal article published in 2019 by Scott M. Lewis ORCID, Matthew S. Hunt, Guy A. DeRose, Hayden R. Alty, Jarvis Li, Alex Wertheim, Lucia De Rose, Grigore A. Timco ORCID, Axel Scherer, Stephen G. Yeates, Richard E. P. Winpenny ORCID
This paper was not found in any repository; the policy of its publisher is unknown or unclear.
This paper was not found in any repository; the policy of its publisher is unknown or unclear.

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