Published in
Elsevier, Materials Science in Semiconductor Processing, 4-6(7), p. 283-288, 2004
DOI: 10.1016/j.mssp.2004.09.131
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Expanding thermal plasma for low-k dielectrics : engineering the film chemistry by means of specific dissociation paths in the plasma
Journal article published in 2004 by
Richard van de Sanden 
,
Mariadriana Adriana Creatore,
W. M. M. Kessels,
Wmm Erwin Kessels,
Yolanda Barrell,
Jan Benedikt ,
Mcm Richard van de Sanden,
M. C. M. van de Sanden
,
Mariadriana Adriana Creatore,
W. M. M. Kessels,
Wmm Erwin Kessels,
Yolanda Barrell,
Jan Benedikt ,
Mcm Richard van de Sanden,
M. C. M. van de Sanden
This paper is available in a repository.
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