The intrinsic stress and morphology of the Stranski-Krastanow system Ge/Si(111) have been investigated at deposition temperatures of 700-950 K. In a broad range of intermediate temperatures, only one distinct decline of stress is observed at the onset of three-dimensional islanding. Supported by a recent transmission electron microscopy study, the results demonstrate that the strain of Ge/Si(111), where the substrate surface in contrast to Ge/Si(001) is the glide plane for dislocations, is relieved by incorporation and continuous rearrangement of dislocations during the island stage. © 1998 American Institute of Physics.