Published in

Nature Research, Scientific Reports, 1(5), 2015

DOI: 10.1038/srep08958

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Maskless milling of diamond by a focused oxygen ion beam

Journal article published in 2015 by Aiden A. Martin, Steven Randolph, Aurelien Botman, Milos Toth, Igor Aharonovich ORCID
This paper is made freely available by the publisher.
This paper is made freely available by the publisher.

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Abstract

AbstractRecent advances in focused ion beam technology have enabled high-resolution, maskless nanofabrication using light ions. Studies with light ions to date have, however, focused on milling of materials where sub-surface ion beam damage does not inhibit device performance. Here we report on maskless milling of single crystal diamond using a focused beam of oxygen ions. Material quality is assessed by Raman and luminescence analysis and reveals that the damage layer generated by oxygen ions can be removed by non-intrusive post-processing methods such as localised electron beam induced chemical etching.