Published in
Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019, 2019
DOI: 10.1117/12.2523931
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Defects in nano-imprint lithography line patterns: computational modelling and measurement accuracy
Proceedings article published in 2019 by
Vassilios Constantoudis,
Guy L. Whitworth 
,
Nikolaos Kehagias,
George Papavieros,
Clivia M. Sotomoyor Torres,
Evangelos Gogolides
,
Nikolaos Kehagias,
George Papavieros,
Clivia M. Sotomoyor Torres,
Evangelos Gogolides
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
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