Impact of Post-Lithography Polymer Residue on the Electrical Characteristics of MoS2 and WSe2 Field Effect Transistors
Journal article published in 2018 by
Jierui Liang 
,
Ke Xu ,
Blaec Toncini,
Brian Bersch,
Bhakti Jariwala,
Yu-Chuan Lin,
Joshua Robinson,
Susan K. Fullerton-Shirey
,
Ke Xu ,
Blaec Toncini,
Brian Bersch,
Bhakti Jariwala,
Yu-Chuan Lin,
Joshua Robinson,
Susan K. Fullerton-Shirey
This paper is made freely available by the publisher.
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