Achieving short high-quality gate-all-around structures for horizontal nanowire field-effect transistors
Journal article published in 2018 by
J. G. Gluschke 
,
J. Seidl,
A. M. Burke ,
R. W. Lyttleton,
D. J. Carrad ,
A. R. Ullah,
S. Fahlvik,
S. Lehmann ,
H. Linke,
A. P. Micolich
,
J. Seidl,
A. M. Burke ,
R. W. Lyttleton,
D. J. Carrad ,
A. R. Ullah,
S. Fahlvik,
S. Lehmann ,
H. Linke,
A. P. Micolich
This paper is made freely available by the publisher.
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